What is the benefits from Plasma Etching over Liquid Etching? - Tantec

Here are some of the many benefits of plasma etching over acid etching

• Improves the physical properties of etched material.
• It sticks two surfaces better than other etchants.
• Unlike acid etchants, plasma etchant is also an excellent cleaner and removes all the unwanted organic residues from the metal surface.
• Although plasma improves chemical and physical properties of the metal, it does not change any property.
• By-products formed during the etching are volatile.
• Plasma etching is less risky than acid etching.

In the context of etching, “volatile by-products” means that the unwanted materials created during the etching process easily turn into a gas. This is a good thing for a few reasons:

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• Easier removal: Volatile gases can be simply sucked out of the etching chamber with a pump, keeping the etching process clean and efficient.
• Less contamination: Non-volatile by-products would stick around and could coat the material being etched or the etching equipment, leading to imperfections or malfunction.

So, using plasma can effectively improve the quality of fabrication of integrated circuits. Moreover, it can also be used for treating delicate semiconductor wafers and a wide range of substrates.

What is Plasma Etching?

One way to modify the physical and chemical properties of metals is plasma etching. The technique is particularly popular in the digital world for the fabrication of integrated chips.

People have been using concentrated acids to etch copper made printed circuit boards for years. But with the introduction of plasma etching system in the late 80s, PCB manufacturers started relying on this technique.

As the name implies it is a technique of etching in which plasma is used as an etchant instead of strong acids. Plasma is the fourth state of matter, formed by ionizing gas particles, through radio frequency or heating. In order to understand the process of plasma etching, it is important to understand the working of a plasma etching system. The system consists of two symmetrical electrodes for the generation of radio frequency and a ground electrode on which the sample to be etched is placed. There is a gas inlet through which etchant enters the system and there is an outlet for plasma. As the gas enters the system, voltage is applied to partially ionize gas particles.

Usually, the frequency of power generated is 13.6MHz, which is considered as a standard plasma forming frequency worldwide. Radiofrequency is utilized to excite gas electrons and change their state. In order to etch a material with plasma, the etching system generates high-speed pulses of plasma. Depending on the type of etching (dry or wet), plasma consists of either ions or radicals. The process of plasma etching also results in the production of volatile chemical compounds, formed as by-products during the chemical reaction between the plasma and the material to be etched. It takes some time for the plasma atoms to embed at the printed circuit board.

Plasma cleaning is an advanced and highly effective method used in various industries to achieve exceptional cleanliness of surfaces. Its role in attaining peak efficiency, security, and dependability cannot be emphasized.

This article will delve into plasma cleaning, exploring its benefits, applications, and functional principles while highlighting real-life examples to illustrate its significance.

When it comes to surface cleanliness, plasma cleaning offers unparalleled advantages. Utilizing energetic ions and reactive species removes contaminants, improves adhesion properties, and preserves the integrity of materials.

Let's take a closer look at each of these benefits:

• Enhanced surface cleanliness: Plasma cleaning goes beyond conventional methods by thoroughly and deeply cleaning surfaces. It removes organic and other contaminants, such as oils, dust, and oxides, leaving surfaces exceptionally clean and free from impurities.
• Efficient removal of contaminants: With its unique ability to break down molecular bonds, plasma cleaning ensures the efficient removal of even the most stubborn contaminants. It tackles surface residues that are challenging to eliminate using traditional cleaning techniques, making it an indispensable tool in various industries.
• Improved adhesion properties: One of the key advantages of plasma cleaning is its ability to enhance the adhesion properties of surfaces. Removing contaminants and activating the surface create a clean and receptive substrate for subsequent processes, such as bonding, coating, or printing. This leads to improved product quality, reliability, and performance.
• Preserving material integrity: Unlike harsh chemical treatments or abrasive methods, plasma cleaning is gentle on delicate materials. It does not cause damage or alter the properties of the surface, ensuring the integrity of the material is preserved. This makes it suitable for various applications, including sensitive electronics and fragile artifacts.

Plasma cleaning involves a series of stages that achieve exceptional surface cleanliness.

Let's explore the process in more detail:

• Gas introduction and ionization: A gas, typically an inert gas or a mixture of gases, is introduced into a jet cavity or chamber under atmosphere – or low-pressure conditions. The gas is then ionized by an electric field, creating a plasma.
• Plasma activation: The plasma contains highly reactive species, such as ions, radicals, and electrons, which are energetically bombarded onto the surfaces to be cleaned.
• Contaminant removal: The energetic bombardment from the plasma breaks down molecular bonds, effectively removing contaminants from the surface. This process is known as etching.
• Surface modification: In addition to removing contaminants, plasma cleaning can modify the material's surface properties. It can activate the surface, enhance wettability, and promote adhesion for subsequent processes.

The interaction between the plasma and surfaces involves various physical and chemical phenomena.

However, the result is a thoroughly cleaned and activated surface, ready for further processing or application.

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The cost of plasma cleaning can vary depending on several factors.

Here are some considerations that can influence the overall expense:

• Equipment and system cost: Plasma cleaning systems can vary in complexity and size, leading to different price points. Purchasing or leasing the equipment is a significant component of the overall cost.
• Process parameters and treatment time: The specific process parameters, such as gas composition, pressure, power, and treatment time, can impact the cost. Longer treatment times or more complex processes may incur higher costs.
• Throughput and productivity: The desired throughput and productivity requirements can influence the cost of plasma cleaning. High-throughput systems may have a higher initial cost but can offer cost savings in increased productivity.
• Maintenance and consumables: Like any equipment, plasma cleaning systems require maintenance and may require consumables, such as gases or electrodes. These factors should be considered when evaluating the overall cost.

While plasma cleaning may have higher upfront costs than traditional cleaning methods, it can provide cost-effectiveness in the long run. Its efficiency, effectiveness, and ability to improve product quality can result in cost savings by reducing rework, improving yield, and enhancing overall process efficiency.

Return on investment (ROI) considerations are essential when evaluating the cost-effectiveness of plasma cleaning. Factors such as improved product quality, reduced rejects, and enhanced customer satisfaction should be considered.

Plasma cleaning excels in the effective removal of various impurities and contaminants from surfaces.

Let's explore the types of pollutants that can be eliminated through plasma cleaning:

• Organic contaminants: Plasma cleaning is highly effective in removing organic residues, including oils, and organic films. The reactive species in the plasma break down the molecular bonds of these contaminants, ensuring their complete removal.
• Biological contaminants: Plasma cleaning has shown promise in removing biological contaminants, including bacteria and viruses. The reactive species in the plasma can break down the cellular structure of these microorganisms, promoting disinfection and cleanliness.
• Chemical residues: Plasma cleaning can remove chemical residues, such as solvents, and etching byproducts. It effectively neutralizes and removes these residues, leaving behind a clean, residue-free surface.

Plasma cleaning's ability to eliminate contaminants makes it a versatile and efficient cleaning method in various industries. Whether organic, inorganic, biological, or chemical contaminants are present, plasma cleaning offers a reliable solution for achieving high cleanliness levels.

Plasma cleaning can be categorized into functional principles based on the gases used.

Let's explore the functional principles and their applications:

• Oxygen and air-based plasma cleaning: Oxygen or air-based plasma cleaning utilizes oxygen gas to create the plasma. It is effective in removing organic contaminants and can induce surface oxidation. Applications of oxygen and air-based plasma cleaning include cleaning electronic components, removing organic residues, and improving wettability.
• Hydrogen-based plasma cleaning: Pure hydrogen or mixtures of hydrogen with inert gases such as nitrogen, are used to generate plasmas that can effectively improve the wettability of very hard to modify polymers such as teflon. Also, these plasmas excel in removing inorganic contaminants and oxide layers from metals, improving surface conductivity, and the performance of electronic components, such as printed circuit boards.

Each functional principle of plasma cleaning offers unique advantages and is suitable for specific applications. The choice of functional principle depends on the desired cleaning outcome, the nature of the contaminants, and the materials being treated.

Plasma cleaning has emerged as a powerful and versatile method for achieving high cleanliness levels in various industries. From enhancing surface cleanliness and improving adhesion properties to improving quality, reliability ensuring sterility and safety, plasma cleaning offers many benefits.

Its advantages over traditional cleaning methods, including superior cleaning capabilities, non-damage to delicate surfaces, and eco-friendliness, make it an attractive option for industries seeking efficient and sustainable cleaning solutions.

As technology advances and industries continue to prioritize cleanliness, the future of plasma cleaning appears promising. Its expanding role and evolving capabilities ensure its continued relevance in addressing the challenges of contamination control, surface treatment, and sterilization in a wide range of applications.

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